摘要
薄膜材料是相对于半导体材料而言的，是人们采用特殊的方法，在半导体材料的表面沉积或制备的一层性质与半导体材料完全不同的物质层。薄膜材料因具有光学性质、电学性质、磁学性质、化学性质、力学性质、热学 性质等多种特性在许多领域得到应用，如电学薄膜、光学薄膜、硬质膜、耐蚀膜、润滑膜、装饰膜、包装膜等。
光催化剂在光照的条件下能够产生强氧化性的自由基，该自由基腀@沟捉到饧负跛械挠谢铮⒆钪丈 H2O、CO2 等无机小分子，加上光催化反应还具有反应条件温和，反应设备简单，二次污染小，操作易于控制，催化材料易得，运行成本低，可望用太阳光为反应光源等优点。研究表明WO3光催化稳定性良好，对光催化降解水中污染物也有较理想的催化效果,而且我国钨蕴藏丰富,居世界第一，WO3有广泛来源。
本实验采用钨粉过氧化聚钨酸法制备基础溶胶，在溶胶中采取添加与无添加草酸对比研究其效果，找出影响WO3薄膜光催化性能的主要因素，研究其对WO3薄膜的成膜性、表面形貌、光催化性能的影响。研究发现在溶胶中添加草酸后WO3薄膜的光催化性能更佳，降解率也有所提高。采用光催化实验分别研究优化的浸渍提拉工艺，脉冲电泳沉积工艺及直流电沉积工艺参数对WO3薄膜光催化性能的影响，找出影响薄膜性能的主要因素，分别对比分析直流电沉积工艺，浸渍提拉工艺及脉冲电泳沉积工艺，研究这三种成膜方式对WO3薄膜光催化性能的影响。研究证明在三种工艺添加草酸后制备的WO3薄膜光催化性能更佳，降解率也比起无添加草酸有提高，最终得到三种工艺当中不管是添加或无添加草酸，直流电沉积工艺制备的WO3薄膜的光催化性能最佳，罗丹明B的降解率也达到了最高。
关键词：WO3薄膜，光催化，浸渍提拉工艺，脉冲电泳沉积工艺，直流电沉积工艺，过氧化聚钨酸
WO3 thin film photocatalytic properties
Abstract
People with a special method in semiconductor material surface preparation a layer of film materials，it is completely different physicality to semiconductor material. Film materials because of its optical properties, electrical properties, magnetic properties, chemical and mechanical properties, thermal properties, such as various characteristics in many areas to be applications such as electrical film, optical thin film, hard film, corrosion resistant film, lubricant, decorative membrane, packaging film, etc.
Light under the condition of catalysts in the illumination can produce strong oxidizing free radicals, this free radicals can thoroughly degraded almost all of the organic matter, and ultimately generate H2O, CO2 and other inorganic of small molecules, plus photocatalytic reaction also has mild reaction condition, reaction, the equipment is simple, secondary pollution small, operation easy control, catalytic materials, low cost and easy operation with the sun light is for reaction etc. Research shows that WO3 photocatalytic good stability, light catalytic degradation water pollutants have ideal catalytic effect, and China's tungsten rich, ranking the first, have extensive WO3 source.
This experiment used tungsten powder together peroxide based sol prepared tungsten acid legal system adopted in sol, add and non-increase oxalic acid contrast research its effect, affecting the WO3 film light catalytic properties, study the main factors of the WO3 film into the membranous, surface morphology, photocatalytic performance influence. The study found that the added after oxalate sol-gel thin WO3 photocatalytic degradation rate performance is better, has also improved. Research by photocatalytic experiments were optimized macerate tiras craft, pulse electrophoresis deposition process and dc WO3 thin film deposition process parameters on the effect of light catalytic properties, find out the main factors of influence film properties respectively, sedimentary processes, comparison and analysis of the dc tilak process and pulse electrophoresis impregnation sedimentary processes, research the three film of photocatalytic WO3 film way properties. Research proof in three process after the WO3 add oxalate preparation of film photocatalytic degradation rate, performance is better than non-increase oxalic acid have also increased, eventually get three process add or non-increase among both sedimentary fabrication processes of oxalic acid, dc WO3 film the best performance of the photocatalytic degradation rates, LuoDanMing B also reached the highest.
Keywords: WO3Film, Photocatalytic, Dip-coating technique, pulsed electrophoretic deposition process, DC current process, peroxide Decatungstate
目 录
摘要 I
Abstract II
第1章 绪论 1
1.1 引言 1
1.2 光催化剂及分类 2
1.2.1 常见光催化剂 2
1.2.2 纳米光催化剂 3
1.3 光催化机理 3
1.4 光催化技术的应用 4
1.4.1 废水处理 4
1.4.2 空气净化 4
1.4.3 超亲水性 4
1.5 氧化钨 5
1.5.1 WO3的晶格特征 5
1.5.2 WO3薄膜的物理化学性质 6
1.6 WO3薄膜的制备方法 6
1.6.1 电化学沉积法 6
1.6.2 溶胶-凝胶法 7
1.6.3 溅射法 9
1.6.4 热蒸发法 9
1.6.5 离子镀技术 9
1.6.6 脉冲电沉积 10
1.7 本课题的研究目的和内容 10
第2章 实验方法 11
2.1 主要实验试剂及仪器 11
2.2 薄膜的制备 12
2.2.1 衬底的前处理 12
2.2.2 溶胶的配制 12
2.3 溶胶成膜 13
2.3.1 浸渍提拉成膜 13
2.3.2 脉冲电沉积成膜 1..
